ITEM DESCRIPTION
Substrate Size 156mm² solar wafer, 4pcs
Deposition Direction Downward
Plasma Source RF & VHF Power Supply
Process Gas Any of Requested Gas (Solar : Si3N4,SiO2,Al2O3)
Process Temperature ~ 700 C
Uniformity ±3%
Heating Uniformity ±3%
Full Automation Control, Load Lock System