Magnetron sputtering vacuum coater is an updated sputtering coating technique with advantages of high sputtering speed, lower temperature, stable performance and simple manipulation, etc.
By this equipment, the metallic film, iridescent film, golden film can be coated with sputtering evaporation on the metals, pre-treated plastic, glass, mica and ceramic products. Just using different targets with reactive gas inflation can realize different films.
Magnetron sputtering vacuum coater is an updated sputtering coating technique with advantages of high sputtering speed, lower temperature, stable performance and simple manipulation, etc. By this equipment, the metallic film, iridescent film, golden film can be coated with sputtering evaporation on the metals, pre-treated plastic, glass, mica and ceramic products. Just using different targets with reactive gas inflation can realize different films. It can be also installed with plane movable targets or central fixed targets for different purposes. The vacuum chamber with double-doors structure makes the coating and substrates loading more efficient and the productivity is highly raised.
Double target magnetron sputtering coater is a small laboratory coater with two targets developed by our company. It can be used to prepare single or multi-layer ferroelectric film, conductive film, alloy film, semiconductor film, ceramic film, dielectric film, optical film, etc.
Compared with ordinary plasma sputtering, magnetron sputtering has the advantages of high energy, high speed, high coating rate and low sample temperature rise, which is a typical high-speed low-temperature sputtering. The magnetron target is equipped with a water-cooled inter layer, the water cooler can effectively take away heat, avoid heat gathering on the target surface, and make the magnetron coating work stably for a long time.
In addition, the device is also equipped with bias power supply, which can add bias electric field between the target and the sample platform, enhance the energy of ions, improve the film quality and adhesion of the film. The whole machine adopts touch screen control, one key coating procedure, simple operation, and is an ideal equipment for preparing thin film in the laboratory.
Three target magnetron sputtering coater is a cost-effective magnetron sputtering coating equipment independently developed by our company. It is standardized, modular and customizable. There are 1-inch or 2-inch magnetron targets for you to choose. Customers can choose the target according to the size of the substrate to be coated. The device is equipped with 500W DC power supply and 500W RF power supply. The DC power supply can be used for the preparation of metal film, and the RF power supply can be used for the preparation of non-metal films. The three targets can meet the needs of multi-layer or multiple coatings. If customers have other coating needs, DC power supply and pulse power supply can be customized. Various types of power supply are available from 300W to 1000W in various specifications.
The coating machine is equipped with two-channel high-precision mass flowmeter. If you have other requirements, you can customize the gas path of up to four-channel mass flowmeters to meet the complex gas environment construction requirements. The instrument is equipped with advanced turbomolecular pump sets, the ultimate vacuum is up to 10E-5Pa, and other types of molecular pumps are available for purchase. Molecular pump gas path is controlled by multiple solenoid valves, you can open the chamber to take out the sample without shutting down the pump, greatly improving your work efficiency. This product can be equipped with an integrated industrial computer to control the system. In the computer program, most functions such as vacuum pump control and sputtering power control can be realized, which can further improve your experimental efficiency.
This device can be used for preparing single-layer or multi-layer ferroelectric thin films, conductive films, alloy films, semiconductor films, ceramic films, dielectric films, optical films, oxide films, hard films, PTFE films, and the like. Compared with similar equipment, this three-target magnetron sputtering coater is not only widely used, but also has the advantages of small size and easy operation, and is an ideal equipment for preparing material films in a laboratory.
High vacuum web coater is specially designed equipment for coating aluminium films or oxidant compound films or other metallic films on rolls of any polyester membranes. It can be also equipped with both wire-feeding system, MF melting pot, DC or MF sputtering metallization function as per customers specific requirements to realize certain coating purposes.
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The dual-target magnetron sputtering coating instrument is a small laboratory coating instrument with two targets developed by our company, which can be used to prepare single-layer or multi-layer ferroelectric thin films, conductive thin films, alloy thin films, semiconductor thin films, ceramic thin films , Dielectric film, optical film, etc.
Compared with ordinary plasma sputtering, magnetron sputtering has the advantages of high energy and high speed. The coating rate is high and the sample temperature rise is low. It is a typical high-speed low-temperature sputtering. The magnetron target is equipped with a water-cooled interlayer. The water chiller can effectively take away the heat, avoid heat accumulation on the target surface, and make the magnetron coating work stably for a long time.
Compared with similar equipment, this dual target magnetron sputtering coating instrument is not only widely used, but also small in size and easy to operate, it is an ideal equipment for preparing thin films in the laboratory.
The magnetron sputtering/vacuum evaporation composite coating equipment combines magnetron sputtering technology and vacuum evaporation technology in one coating equipment. In this device, magnetron sputtering cathode glow discharge is used to sputter the target atoms and partially ionize and deposit them on the substrate to form a film, and at the same time, the metal plating material can be melted in a vacuum by resistance heating and vaporized and then deposited on the substrate to form a film. This increases the utility and flexibility of the device. The equipment is used for metallization of plastic surface such as mobile phone case and deposition of non-conductive film and electromagnetic shielding film.
The magnetron sputtering/vacuum evaporation composite coating equipment is equipped with a plasma processing device, a high-efficiency magnetron sputtering cathode and a resistance evaporation device, etc. The deposition rate of this device is fast, the coating adhesion is good, the plating layer is fine and compact, the surface finish is high, the uniformity and consistency is good; the machine realizes full automatic control of coating process, large load, reliable work, high qualification rate, low production cost and green environmental protection. The device is widely used in computer casings, mobile phone cases, household appliances and other industries, and can be coated with metal film, alloy film, composite film layer, transparent (translucent) film, non-conductive film, electromagnetic shielding film and the like.
Three targets DC magnetron sputtering coater is a cost-effective magnetron sputtering coating equipment independently developed by our company. It is standardized, modular and customizable. There are 1-inch or 2-inch magnetron targets for you to choose. Customers can choose the target according to the size of the substrate to be coated. The device is equipped with 500W DC power supply. The DC power supply can be used for the preparation of metal film. The three targets can meet the needs of multi-layer or multiple coatings. If customers have other coating needs, DC power supply and pulse power supply can be customized. Various types of power supply are available from 300W to 1000W in various specifications.
The coating machine is equipped with two-channel high-precision mass flowmeter. If you have other requirements, you can customize the gas path of up to four-channel mass flowmeters to meet the complex gas environment construction requirements. The instrument is equipped with advanced turbomolecular pump sets, the ultimate vacuum is up to 1.0E-5Pa, and other types of molecular pumps are available for purchase. Molecular pump gas path is controlled by multiple solenoid valves, you can open the chamber to take out the sample without shutting down the pump, greatly improving your work efficiency. This product can be equipped with an integrated industrial computer to control the system. In the computer program, most functions such as vacuum pump control and sputtering power control can be realized, which can further improve your experimental efficiency.
Three target magnetron sputtering coater is a cost-effective magnetron sputtering coating equipment independently developed by our company. It is standardized, modular and customizable.
This device can be used for preparing single-layer or multi-layer ferroelectric thin films, conductive films, alloy films, semiconductor films, ceramic films, dielectric films, optical films, oxide films, hard films, PTFE films, and the like. Compared with similar equipment, this three-target magnetron sputtering coater is not only widely used, but also has the advantages of small size and easy operation, and is an ideal equipment for preparing material films in a laboratory.
High vacuum magnetron sputtering coater is specially designed for automobile & motorcycle hubcap coating or metallizing with unique features and special structure designed, enabling to meet the needs of all the technical demands. Equipped with cryo-pump (Poly-Cold), it can realize very high coating efficiency.
With specially designed cathodes structure to realize sputtering high ratio, it can accomplish each coating cycle within 8~12 minutes under computer & PLC control.
The substrate rack driving system with both revolution and rotation functions plus substrate self-rotation, is able to ensure the coating evenness and uniformity.
temperable mirror is processed by sputtering coating technology craft, without painting in the backing side.
temperable mirror can be tempered as float glass to increase the safety factory .
temperable mirror is more durable without stainted edge problem caused by backing painting.
Our company takes technical innovation to update the design of our mf sputtering deposition, coupled with cvd and thermal evaporation technology into a comprehensive deposition. Thus, it greatly improved the sputtering quality with characteristics of good adhesion, hardness, with functions of anti-impurity, anti-friction, anti-aging, anti-solution of film deposited. So the coated substrates are able to pass the quality tests, such as solution soaking and water boiling. This kind of model machines can deposit ar, af or as films in the same batch for mass production, appropriate to the decorative coating on metal and glass substrates. By this kind of model machines the anti-fingerprint deposition can be realized by our innovative method.
This kind of mf sputtering machines has features of large-quantity substrate loading with advantages of high efficiency, simple process, convenient manipulation and high uniformity, widely applicable for in the production fields of mobile, golf, digital camera, computer and other electric apparatus.
Cathodic Arc PVD Coater adopts a method of arc discharge to evaporate directly metal from solid cathode targets and the evaporated material is ions from cathode substance released from the cathode arc glow, thereby deposit films on the surface of the substrate.
This equipment is designed to use advanced plasma technology, combining technique of electric arc discharging with magnetron sputtering coating technique by reactive coating method, for achievement of imitation of golden film, gold saturated film as well as other superior decorating films.
Automatic optical coating equipment equipped with fan-shaped multi-fixtures or vaulted single substrate plate, uses man-machine interface with touch screen plus PLC and automatic crystal thickness control system to realize full automatic control, enabling to achieve functions of parameter input, process monitoring and data storage, etc. So the operation process can be set and the machine runs automatically to achieve the coating repeatability with optical properties of a stable quality. It has solved the complexity of manual operation and the problems of uniformity of film color, optical performance and others.
Optical coating equipment can coat multi-layers of short-wave pass, long wave pass, antireflection film (AR), reflective film, filter film, spectral film, band pass film, dielectric film, high reflective film, color reflective film, etc, enabling to achieve 0-99 layers of film coating, also able to meet technical requirements such as automotive reflective light cover, binoculars, glasses, optical lenses, cold-light cups and other products coating. Equipped with different evaporation source, E-beam gun and ion source as well as film thickness monitoring and control system can realize various film coating systems, such as metal, oxide, compound and other high melting point films can be deposited, even super-hard film can be coated on the glass surface.
It is extensively used in many fields such as in optical, electronic, decorative industries and in research institute or film research and application fields.
To coat optical film or decorative film or functional film on large-sized substrate products such as glass or plastic panels, or to realize mass production of vacuum coating for rhinestone, lamp glass slip, round shape articles as glass tube, lamp tube, the horizontal type E-beam optical coater is the best choice for customers.
Horizontal structure E-beam optical coater generally can have large quantity substrate loading with single or double revolution and rotation substrate racks to realize three dimensional moves to make single side coating or all-round uniform coating for round shape substrates.
Complete manufacturing line for cigs solar cell (turn-key project)
During the past years our company absorbed the world advanced technology for production of various solar cells and now we have a powerful technical team capable of supplying a complete manufacturing line for cigs solar cell (turn-key project).
Our company is able to undertake the construction of a large, medium or small sized cigs project as per customer, s needs and requirements.
Complete manufacturing line for cigs solar cell (turn-key project)
During the past years our company absorbed the world advanced technology for production of various solar cells and now we have a powerful technical team capable of supplying a complete manufacturing line for cigs solar cell (turn-key project).
Our company is able to undertake the construction of a large, medium or small sized cigs project as per customer, s needs and requirements.
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