Please click here to check who's online and chat with them.

Zirconium Sputtering Target

Supplier From China
Apr-25-25

Zirconium Sputtering Targets
Thanks to their economy and reliability against wear, titanium(Ti) and zirconium(Zr) are widely used as the coatings of drills, milling machines and other tools. Moreover, zirconium sputter target is applied in decorative coatings. We supply both materials as sputtering targets with the finished products and semi-finished products.

Zirconium Sputtering Targets
Zirconium sputtering targets are essential materials for the thin film deposition industry and are primarily used in the Physical Vapor Deposition (PVD) process. Zirconium sponges and wafers are the raw materials for sputtering targets. Although zirconium targets are inexpensive and of low purity, they have a high oxygen content. Zirconium wafers are more costly and pure, making them ideal for sputtering targets. Zirconium (Zr) is a transition metal known for its excellent corrosion resistance, high melting point, and compatibility with various coating applications.

Price and Minimum Quantity

Price: $10 - $100 / Set (FOB)
MOQ: Not Specified
Product Grade: atargets

Recent User Reviews

This user has not received any reviews yet!

Verification Status


 
 
Contact Supplier
Renew

More Items Similiar to: Zirconium Sputtering Target

Nov-09-21
 
Sputtering is a new type of Physical Vapor Deposition (PVD) method.

Sputtering is widely used in: flat panel displays, glass industry (include architectural glass, automotive glass, optical film glass), solar cells, surface engineering, recording media, microelectronics, automotive lights and decorative coating, etc..
The sputtering is mainly used in: flat panel displays, coated glass industry (including architectural glass, automotive glass, optical glass and other films), thin-film solar, surface engineering (decorative & Tools), (magnetic, optical) recording medium Microelectronics car lights, decorative coating.

In the field of Rotatable Target, Kewei first proposed the monolithic tube target in the year 2009, which has been recognized by domestic and foreign customers. We can provide the following sizes according to the requirements of customers:

Planar target: single weight: 260kg, purity: 99.97%
Rotatable target: OD:140-180mm;ID: 125-135mm. length 3300mm ,purity: 99.97%
Apr-25-25

Sputtering Target, atargets

$10 - $100 / Set (FOB)
MOQ: Not Specified
 
Sputtering Target Supplier
Sputtering target supply service provides premium materials for thin film deposition across industries such as electronics, photovoltaics, and optics. We specialize in high-performance targets that offer superior deposition rates, excellent uniformity, and outstanding adhesion properties. As a trusted USA-based sputtering target supplier, we understand the importance of quality and consistency in every order. We offer a wide range of materials, from pure metals to alloys, designed to meet the unique requirements of each application. With a focus on fast and reliable delivery, you can trust us to keep your production processes running smoothly without delays.



Advanced Targets produces premium custom sputtering targets utilized by our global customer base for applications such as thin-film physical vapor deposition (PVD), laser ablation deposition (PLD), semiconductor magnetron sputtering, displays, LEDs, photovoltaic devices, lithium-ion batteries, and more. We are a reliable producer and provider of sputtering targets for research and production environments.
Aug-23-17
 
Item nameHigh Quality Molybdenum Sputtering Target
MaterialPure Molybdenum
Size
All sizes as you need
Surface TreatmentPolishing Rolling
ColorOriginal
PackageWodden case
lined with foam or according to your requirements
Production advantage 1,we have CNC milling,CNC lathe,c-axes Gang Tool Type CNC , Lathe,25-tool-changer CNC milling
2.wire-electrode cutting device
3.special-purpose machines for standard parts production
4.Ancillary Equipment
OEM1.Free laser logo
2.Signed NDA ,Accept any products customization
3.Free basic packaging
Jun-23-16
 
Product name:aluminium
Chemical formula:al
Melting point:660?
Boiling point:2327?
Density:2.70g/cm3
Particle size:uniform
Tolerance: ±0.1mm
Brand:yipin
Origin:beijing
Product dimension:custom
Production process:vacuum melting, hot isostatic pressing, machining processing
Aapplication:aerospace, microelectronics, optoelectronics, , semiconductors and device, integrated circuits, optical coating, cars and glass decorative coating, flat panel display, magnetic storage and magnetic recording, solar photovoltaic (pv)
Service: bonding target to backing plate
Package: vacuum packing
Freight: fedex, dhl, tnt or customer specified
Moq: 1
Supply capacity: stable
Delivery: 7 to 20 days
Payment: t/t, west union, d/p and others
Related products: al particles, al wire, al alloys

Main business introduction
Sputtering target, evaporation coating materials, high purity metal materials
Ag, al, bi, co, cr, cu, fe, ge, hf, in, mg, mn, mo, nb, ni, pt, sb, se, si, sn, ta, te, ti, v, w, zn, zr, al2o3,
Cigs, pzt, azo, ito, nife, wti, niv, agcu, etc.(99.99%purity min),
Pure metal pieces, evaporation materials, crystal materials
Jun-29-16
 
Beijing Yipin target Co., Ltd is a high-tech enterprise which possesses research and manufacture, sales and services all in one of high purity non-ferrous metals, evaporation coating materials, sputtering targets, and a variety of new high-tech materials.

We are dealing 99.9%-99.9999% purity of targets, pellets, wire, powder,ingots, foil, disks, rods, tubes and plates as below:

Simple substance:
Al, B, Bi, C, Ca, Co, Cr, Cu, Fe, Ge, Hf, Mg, Mn, Mo, Nb, Ni, In, Sb, Se, Si, Sn, Sr, Ta, Te, Ti, V, Zn, Zr, W etc.

Precious Metals:
Au, Ag, Pt, Pd, Ru Rh, Ir etc

Ceramics:
Al2O3,Bi2O3,Cr2O3),CuO,Cu2O,,Fe2O3,Fe3O4),HfO2,In2O3),MgO,MoO3,
Nb2O5,NiO,SiO2,SnO2,Ta2O5,TiO2,V2O5,WO3,ZnO,CeO2,Sc2O3
Dy2O3,Y2O3,SrTiO3, BaTiO3, BaSrTiO3,PZT,SrZrO3,PbZrO3,
Li3PO4,LiFePO4,LSMO,BiFeO3, LiMn2O4,KNbO3,CuAlO2,LaAl2O3,
ITO,AZO,IGZO,IZO,ATO,YSZ,YBCO,FTO
AlN,BN,TiN,VN,NbN,Si3N4,
CuS,Cu2S,In2S3,SnS2,SnS,ZnS,CdS,PbS,Sb2S3,,MoS2,
CdTe,PbTe,ZnTe,Bi2Te3,In2Te3,
Sb2Te3,Bi2Se3,In2Se3,ZnSe,Pb2Se3,CdSe,
MgF2,CaF2,BaF2,In2Sb3,PbSb,Bi2Sb3,GaSb,
TiB2,WB2,ZrB2,B4C,SiC,WC etc.

Alloys: AlCu,AlCr,AlNd,AlSi,AlSiCu,AlMn,CIGS,CuGa,CuMn,CuNi,CuSn,CuZn,FeGa,FeMn,FeCr,FeSi,NiCr,NiFe,NiSi,NiV,NiCrSi,TiAl,TiSi,TiNi,TiCr,TiW,SiAl,CoFeB,MnNi,MoSi,TaW,WTi,AlSc,CeSm,DyFe,NdFeB,TbDyFe,TbFeCo etc.

Rare earth:
La, Ce, Pr, ND, Pm, Sm, EU, Tb, Dy, Ho, Er, TM, Yb, Lu, Y etc.





vacuum packing,custom
Jun-29-16
 
The main product of YPCC are high purity metal sputtering target materials,
oxide sputtering target materials, evaporation coating materials, high purity metal materials,
alloy materials, ceramic materials¡ê¬and precious metal materials which are mainly used in flat panel displays,
electronic semiconductor field, coated glass industry, magneto-optical recording media,
thin-film solar industry, decoration and tools coating, and automobile headlights coating etc.





vacuum-packed
Apr-25-25
 
Sputtering Target for Thin Film Deposition
Sputtering is a physical vapor deposition (PVD) process where atoms are ejected from the surface of a material when it is bombarded by high-energy particles. In sputtering deposition, a controlled gas, typically inert argon, is introduced into a vacuum chamber. A cathode is then electrically energized to create a self-sustaining plasma. The surface of the cathode that is exposed is known as the sputtering target.

Sputtering targets are usually solid pieces that come in various sizes and shapes. These targets can be made from pure metals, alloys, or compounds such as oxides or nitrides. The substrate, which is the object to be coated, can be a semiconductor wafer, a solar cell, an optical component, or many other types of materials. The thickness of the coatings typically ranges from angstroms to microns. The thin film can consist of a single material or multiple materials in a layered structure.
Jun-23-16
 
Product name:AuGe
Chemical formula:AuGe
Particle size:uniform
Tolerance: ±0.1mm
Brand:YiPin
Origin:Beijing
Product dimension:custom
Production process:Vacuum melting, hot isostatic pressing, machining processing
Aapplication:aerospace, microelectronics, optoelectronics,,Semiconductors and device,integrated circuits,optical coating,cars and glass decorative coating,flat panel display, magnetic storage and magnetic recording, solar photovoltaic (pv)
Service: bonding target to backing plate
Package: vacuum packing
Freight: Fedex, DHL, TNT or customer specified
MOQ: 1
Supply Capacity: stable
Delivery: 7 to 20 days
Payment: T/T, West Union, D/P and others
Related products: AgFe,AlCuZn,AlMgSi,InGaZn,NiV


Main business introduction

Beijing Yipin target Co., Ltd is a high-tech enterprise which possesses research and manufacture, sales and services all in one of high purity non-ferrous metals, evaporation coating materials, sputtering targets, and a variety of new high-tech materials.

We are dealing 99.9%-99.9999% purity of targets, pellets, wire, powder,ingots, foil, disks, rods, tubes and plates as below:

Simple substance:
Al, B, Bi, C, Ca, Co, Cr, Cu, Fe, Ge, Hf, Mg, Mn, Mo, Nb, Ni, In, Sb, Se, Si, Sn, Sr, Ta, Te, Ti, V, Zn, Zr, W etc.

Precious Metals:
Au, Ag, Pt, Pd, Ru Rh, Ir etc

Ceramics:
Al2O3,Bi2O3,Cr2O3),CuO,Cu2O,,Fe2O3,Fe3O4),HfO2,In2O3),MgO,MoO3,
Nb2O5,NiO,SiO2,SnO2,Ta2O5,TiO2,V2O5,WO3,ZnO,CeO2,Sc2O3
Dy2O3,Y2O3,SrTiO3, BaTiO3, BaSrTiO3,PZT,SrZrO3,PbZrO3,
Li3PO4,LiFePO4,LSMO,BiFeO3, LiMn2O4,KNbO3,CuAlO2,LaAl2O3,
ITO,AZO,IGZO,IZO,ATO,YSZ,YBCO,FTO
AlN,BN,TiN,VN,NbN,Si3N4,
CuS,Cu2S,In2S3,SnS2,SnS,ZnS,CdS,PbS,Sb2S3,,MoS2,
CdTe,PbTe,ZnTe,Bi2Te3,In2Te3,
Sb2Te3,Bi2Se3,In2Se3,ZnSe,Pb2Se3,CdSe,
MgF2,CaF2,BaF2,In2Sb3,PbSb,Bi2Sb3,GaSb,
TiB2,WB2,ZrB2,B4C,SiC,WC etc.

Alloys: AlCu,AlCr,AlNd,AlSi,AlSiCu,AlMn,CIGS,CuGa,CuMn,CuNi,CuSn,CuZn,FeGa,FeMn,FeCr,FeSi,NiCr,NiFe,NiSi,NiV,NiCrSi,TiAl,TiSi,TiNi,TiCr,TiW,SiAl,CoFeB,MnNi,MoSi,TaW,WTi,AlSc,CeSm,DyFe,NdFeB,TbDyFe,TbFeCo etc.

Rare earth:
La, Ce, Pr, ND, Pm, Sm, EU, Tb, Dy, Ho, Er, TM, Yb, Lu, Y etc.
Aug-23-11
Supplier From Xi'an, Shannxi, China

Verification Status