CHEMAT TECHNOLOGY, INC. Has designed and manufactured a compact and easy-to-use hotplate, Model KW-4AH, for baking and curing thin films and coatings. Its rugged, portable design, and temperature uniformity make it a versatile tool for research facilities. In conjunction with KW-4A spin coater, KW-4AH hotplate can be used to fabricate metal oxide thin films, polymer coatings and metal organic thin films.

Operation: Manual Load
Process Control: Program (For details see OMRAN operation manual)
Temperature fluctuation: 1C
Temperature uniformity: 3%
Temperature Range:
¡ª30C - 350C (KW-4AH-350)
¡ª30C - 600C (KW-4AH-600)
Substrate Size:
¡ª7.5 inch X 7.5 inch(KW-4AH-350)
¡ª5.8 inch X 5.8 inch(KW-4AH-600)
Inert gas purge (KW-4AH-600 only).